HTS
2023 HTSA Revision 9
Search Results:9
9031.49
Other:
9031.49.10.00
Profile projectors
9031.49.40.00
Coordinate-measuring machines
9031.49.70.00
For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices
9031.49.90.00
Other
9031.90.45.00
Bases and frames for the coordinate-measuring machines of subheading 9031.49.40
9031.90.54.00
Of optical instruments and appliances of subheading 9031.41 or 9031.49.70
9031.90.45.00
Bases and frames for the coordinate-measuring machines of subheading 9031.49.40
9031.90.54.00
Of optical instruments and appliances of subheading 9031.41 or 9031.49.70
| Heading/ Subheading |
Stat Suffix |
Article Description | Unit of Quantity |
Rates of Duty | ||
| 1 | 2 | |||||
| General | Special | |||||
| Heading/ Subheading |
Stat Suffix |
Article Description | Unit of Quantity |
Rates of Duty | ||
| 1 | 2 | |||||
| General | Special | |||||
| 9031 | Measuring or checking instruments, appliances and machines, not specified or included elsewhere in this chapter; profile projectors; parts and accessories thereof: | |||||
| 9031.10.00 | 00 | Machines for balancing mechanical parts | No. | Free | 40% | |
| 9031.20.00 | 00 | Test benches | No. | 1.7% | Free (A*,AU,BH,CL,CO,D,E,IL,JO,KR,MA,OM,P,PA,PE,S,SG) | 45% |
| Other optical instruments and appliances: | ||||||
| 9031.41.00 | For inspecting semiconductor wafers or devices (including integrated circuits) or for inspecting photomasks or reticles used in manufacturing semiconductor devices (including integrated circuits) | Free | 50% | |||
| 20 | For inspecting photomasks or reticles used in manufacturing semiconductor devices | No. | ||||
| For inspecting semiconductor wafers or devices: | ||||||
| 9031.41.00 | 40 | For wafers | No. | |||
| 60 | Other | No. | ||||
| 9031.49 | Other: | |||||
| 9031.49.10 | 00 | Profile projectors | No. | Free | 45% | |
| 9031.49.40 | 00 | Coordinate-measuring machines | No. | Free | 50% | |
| 9031.49.70 | 00 | For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices | No. | Free | 50% | |
| 9031.49.90 | 00 | Other | No. | Free | 50% | |
| 9031.80 | Other instruments, appliances and machines: | |||||
| 9031.80.40 | 00 | Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles | No. | Free | 40% | |
| 9031.80.80 | Other | Free | 40% | |||
| Equipment for testing the characteristics of internal combustion engines: | ||||||
| 9031.80.80 | 60 | For testing electrical characteristics | kg | |||
| 70 | Other | kg | ||||
| 85 | Other | kg | ||||
| 9031.90 | Parts and accessories: | |||||
| 9031.90.21 | 00 | Of profile projectors | kg | Free | 45% | |
| Of other optical instruments and appliances, other than test benches: | ||||||
| 9031.90.45 | 00 | Bases and frames for the coordinate-measuring machines of subheading 9031.49.40 | kg | Free | 50% | |
| 9031.90.54 | 00 | Of optical instruments and appliances of subheading 9031.41 or 9031.49.70 | kg | Free | 50% | |
| 9031.90.59 | 00 | Other | kg | Free | 50% | |
| Other: | ||||||
| 9031.90.70 | 00 | Of articles of subheading 9031.80.40 | kg | Free | 40% | |
| 9031.90.91 | Other | Free | 40% | |||
| 30 | Of machines for balancing mechanical parts | kg | ||||
| 60 | Of test benches | kg | ||||
| 95 | Other | kg | ||||